publication venue for

• Film and surface stress during Al₂O₃ thermal atomic layer etching using in situ wafer curvature measurements 2026
• Thermal atomic layer etching of SnO₂ by fluorination and ligand-exchange/conversion reactions using sequential hydrogen fluoride and Al(CH₃)₃ exposures 2026
• Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride 2024
• Removing defects from sputter damage on InGaP surfaces using thermal atomic layer etching 2024
• Ultrathin ZrO₂ thickness control on TiO₂/ZrO₂ core/shell nanoparticles using ZrO₂ atomic layer deposition and etching 2024
• Al₂O₃ atomic layer deposition on a porous matrix of carbon fibers (FiberForm) for oxidation resistance 2023
• Electron-enhanced atomic layer deposition of Ru thin films using Ru(DMBD)(CO)₃ and effect of forming gas anneal 2023
• Electron-enhanced SiO₂ atomic layer deposition at 35 °C using disilane and ozone or water as reactants 2023
• Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition 2023
• Thermal atomic layer etching of VO₂ using sequential BCl₃ and SF₄ exposures: Observation of conversion, ligand-exchange, and oxidation state changes 2023
• Spontaneous etching of B₂O₃ by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory 2022
• Deposit and etchback approach for ultrathin Al₂O₃ films with low pinhole density using atomic layer deposition and atomic layer etching 2021
• Molecular layer deposition of Nylon 2,6 polyamide polymer on flat and particle substrates in an isothermal enclosure containing a rotary reactor 2021
• Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition 2021
• Thermal atomic layer etching of amorphous and crystalline Al₂O₃ films 2021
• Thermal atomic layer etching: A review 2021
• Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica 2021
• Atomic layer deposition of hafnium and zirconium oxyfluoride thin films 2021
• Conversion reactions in atomic layer processing with emphasis on ZnO conversion to Al₂O₃ by trimethylaluminum 2021
• Thermal atomic layer etching of germanium-rich SiGe using an oxidation and "conversion-etch" mechanism 2021
• Thermal ranges and figures of merit for gold-containing precursors for atomic layer deposition 2021
• Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition 2020
• History of atomic layer deposition and its relationship with the American Vacuum Society (vol 31, 050818, 2013) 2020
• Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry 2020
• Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide 2020
• Thermal atomic layer etching of silicon nitride using an oxidation and "conversion etch" mechanism 2020
• Thermal etching of AlF₃ and thermal atomic layer etching of Al₂O₃ 2020
• Growth of cobalt films at room temperature using sequential exposures of cobalt tricarbonyl nitrosyl and low energy electrons 2019
• Rapid atomic layer etching of Al₂O₃ using sequential exposures of hydrogen fluoride and trimethylaluminum with no purging 2018
• Thermal atomic layer etching of HfO₂ using HF for fluorination and TiCl₄ for ligand-exchange 2018
• Electron-enhanced atomic layer deposition of silicon thin films at room temperature 2018
• Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes 2018
• Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor 2018
• Structural and compositional characterization of RF magnetron cosputtered lithium silicate films: From Li2Si2O5 to lithium-rich Li8SiO6 2017
• Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)₂ reactions and enhancement by H₂ and Ar plasmas 2016
• Probabilistic distributions of pinhole defects in atomic layer deposited films on polymeric substrates 2016
• Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al₂O₃ on Li ion battery electrodes 2016
• Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates 2015
• Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor 2015
• Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness 2014
• Waterless TiO2 atomic layer deposition using titanium tetrachloride and titanium tetraisopropoxide 2014
• History of atomic layer deposition and its relationship with the American Vacuum Society 2013
• Evaluating Al₂O₃ gas diffusion barriers grown directly on Ca films using atomic layer deposition techniques 2013
• In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygen 2012
• Evaluating operating conditions for continuous atmospheric atomic layer deposition using a multiple slit gas source head 2012
• Nanocoating zinc alkoxide (zincone) hybrid polymer films on particles using a fluidized bed reactor 2012
• Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition 2012
• Phase, grain structure, stress, and resistivity of sputter-deposited tungsten films 2011
• Photovoltaic manufacturing: Present status, future prospects, and research needs 2011
• Nucleation and growth of tantalum nitride atomic layer deposition on Al₂O₃ using TBTDET and hydrogen radicals 2009
• Tungsten atomic layer deposition on cobalt nanoparticles 2008
• Optimized reactive ion etch process for high performance SiC bipolar junction transistors 2007
• Rotary reactor for atomic layer deposition on large quantities of nanoparticles 2007
• Wide-range vibratory vacuum gauge 2006
• Attenuation of hydrogen radicals traveling under flowing gas conditions through tubes of different materials 2006
• Free molecular background flow in a vacuum chamber equipped with two-sided pumps 2006
• In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques 2005
• Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO₂ and BaTiO₃ particles 2005
• Infrared spectroscopic study of atomic layer deposition mechanism for hafnium silicate thin films using HfCl₂[N(SiMe₃)₂]₂ and H₂O 2004
• Microstructure and properties of ultrathin amorphous silicon nitride protective coating 2003
• Charging of dust particles on surfaces 2001
• Monte Carlo modeling of electron beam physical vapor deposition of yttrium 2000
• Monte Carlo simulation of vapor transport in physical vapor deposition of titanium 2000
• Modeling of silicon deposition process scale-up employing axisymmetric ring nozzle sources. I 1999
• Three dimensional modeling of silicon deposition process scale-up employing supersonic jets. II 1999
• Nonlinear modeling, identification, and feedback control design for the modern effusion cell 1998
• Effects of wall recombination on the etch rate and plasma composition of an etch reactor 1998
• Numerical simulation of the evolution of nanometer-scale surface topography generated by ion milling 1998
• Monte Carlo analysis of a hyperthermal silicon deposition process 1998
• Influence of cluster diffusion on the coarsening of Xe films on Pt(111) 1997
• Numerical study of the effects of reactor geometry on a chlorine plasma helicon etch reactor 1997
• Particle beam mass spectrometer measurements of particle formation during low pressure chemical vapor deposition of polysilicon and SiO2 films 1996
• H2O ADSORPTION-KINETICS ON SI(111)7X7 AND SI(111)7X7 MODIFIED BY LASER ANNEALING 1995
• HYPERTHERMAL NEUTRAL BEAM ETCHING 1995
• SAMPLE MANIPULATOR EMPLOYING A GAS-THERMAL SWITCH DESIGNED FOR HIGH-PRESSURE EXPERIMENTS IN AN ULTRAHIGH-VACUUM APPARATUS 1995
• ADSORPTION AND DECOMPOSITION OF DICHLOROSILANE ON POROUS SILICON SURFACES 1995
• ADSORPTION AND DECOMPOSITION OF TRICHLOROSILANE AND TRICHLOROGERMANE ON POROUS SILICON AND SI(100)2X1 SURFACES 1995
• DYNAMICS OF THE DESORPTION OF D(2) AND H-2 FROM CU(111) 1993
• DYNAMIC STUDIES OF THE INTERACTION OF D2 WITH A CU(111) SURFACE 1992
• ADSORPTION AND DESORPTION-KINETICS FOR SIH2CL2 ON SI(111)7X7 1992
• A REACTIVE COEVAPORATION SYSTEM FOR INSITU, EPITAXIAL YBA2CU3O7-X THIN-FILM DEPOSITION 1991
• AMMONIA DECOMPOSITION ON SILICON SURFACES STUDIED USING TRANSMISSION FOURIER-TRANSFORM INFRARED-SPECTROSCOPY 1991
• THE GOLD HIGH-TEMPERATURE SUPERCONDUCTOR INTERFACE - METALLICITY OF THE NEAR-SURFACE REGION AND A SEARCH FOR THE PROXIMITY EFFECT 1991
• ROUGHNESS AND POROSITY CHARACTERIZATION OF CARBON AND MAGNETIC-FILMS THROUGH ADSORPTION-ISOTHERM MEASUREMENTS 1989
• ELECTRONIC-STRUCTURE AND STABILITY OF II-VI SEMICONDUCTORS AND THEIR ALLOYS - THE ROLE OF METAL D-BANDS 1988
• INTERACTIONS AND ELECTRONIC-ENERGY TRANSFER BETWEEN MOLECULES ON DIELECTRIC SURFACES - PHENANTHRENE ON AL2O3(1120) 1988
• SURFACE-DIFFUSION OF CO ON RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION 1988
• SURFACE-DIFFUSION OF CYCLOALKANES ON RU(001) 1988
• SURFACE-DIFFUSION OF HYDROGEN ON CARBON-COVERED AND SULFUR-COVERED RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION 1988
• THE COPPER SILICON INTERFACE - COMPOSITION AND INTERDIFFUSION 1988
• HIGH-SPEED SCANNING TUNNELING MICROSCOPES 1988
• THE DECOMPOSITION KINETICS OF METHANOL ON RU(001) STUDIED USING LASER-INDUCED THERMAL-DESORPTION 1987
• Deposition of TiN and Ti(O,C,N) hard coatings by a plasma assisted chemical vapor deposition process 1986
• A SIMPLE AND VERSATILE LIQUID-NITROGEN COOLED CRYOSTAT ON A DIFFERENTIALLY PUMPED ROTARY FEEDTHROUGH 1986
• OXIDE FORMATION ON ALUMINUM IN THE PRESENCE OF KEV ELECTRONS AND CO2 1984
• ANALYSIS OF CO-DOPED IRON-OXIDE THIN-FILMS BY GRAZING-INCIDENCE X-RAY-DIFFRACTION 1988
• LOW-ENERGY ELECTRON-DIFFRACTION STUDY OF THE PHASES AND PHASE-TRANSITIONS OF OXYGEN PHYSISORBED ON GRAPHITE 1984