Thermal atomic layer etching of SnO2 by fluorination and ligand-exchange/conversion reactions using sequential hydrogen fluoride and Al(CH3)3 exposures Journal Article uri icon

Overview

publication date

  • March 1, 2026

Date in CU Experts

  • July 2, 2026 3:50 AM

Full Author List

  • Li C; Partridge JL; Colleran TA; Duffield MH; Ham YH; George SM

author count

  • 6

citation count

  • 0

Other Profiles

International Standard Serial Number (ISSN)

  • 0734-2101

Electronic International Standard Serial Number (EISSN)

  • 1520-8559

Additional Document Info

volume

  • 44

issue

  • 2

number

  • ARTN 022604