Deposit and etchback approach for ultrathin Al2O3 films with low pinhole density using atomic layer deposition and atomic layer etching Journal Article uri icon

Overview

publication date

  • December 1, 2021

has restriction

  • closed

Date in CU Experts

  • November 9, 2021 3:13 AM

Full Author List

  • Gertsch JC; Sortino E; Bright VM; George SM

author count

  • 4

citation count

  • 9

Other Profiles

International Standard Serial Number (ISSN)

  • 0734-2101

Electronic International Standard Serial Number (EISSN)

  • 1520-8559

Additional Document Info

volume

  • 39

issue

  • 6

number

  • ARTN 062602