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Thermal and Environmental Stability of Semi-Transparent Perovskite Solar Cells for Tandems Enabled by a Solution-Processed Nanoparticle Buffer Layer and Sputtered ITO Electrode Journal Article
Thermal and Illumination Environments of Lunar Pits and Caves: Models and Observations From the Diviner Lunar Radiometer Experiment Journal Article
Thermal and magnetic properties of the spin-chain material Pr3RuO7 Journal Article
Thermal and Nonlinear Dissipative-Soliton Dynamics in Kerr-Microresonator Frequency Combs Journal Article
Thermal and Structural Analysis of a Suspended Physics Package for a Chip-Scale Atomic Clock Journal Article
Thermal and thermo-oxidative degradation of tetrafluoroethylene-propylene elastomer above 300 °C Journal Article
Thermal asperity trends Journal Article
Thermal Atomic Layer Etching of Al₂O₃ Using Sequential HF and BCl₃ Exposures: Evidence for Combined Ligand-Exchange and Conversion Mechanisms Journal Article
Thermal Atomic Layer Etching of Al₂O₃, HfO₂, and ZrO₂ Using Sequential Hydrogen Fluoride and Dimethylaluminum Chloride Exposures Journal Article
Thermal Atomic Layer Etching of Aluminum Nitride Using HF orXeF₂for Fluorination and BCl₃for Ligand Exchange Journal Article
Thermal atomic layer etching of amorphous and crystalline Al₂O₃ films Journal Article
Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition Journal Article
Thermal atomic layer etching of CoO using acetylacetone and ozone: Evidence for changes in oxidation state and crystal structure during sequential exposures Journal Article
Thermal Atomic Layer Etching of CoO, ZnO, Fe2O3, and NiO by Chlorination and Ligand Addition Using SO2Cl2 and Tetramethylethylenediamine Journal Article
Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)₂ reactions and enhancement by H₂ and Ar plasmas Journal Article
Thermal atomic layer etching of crystalline GaN using sequential exposures of XeF₂ and BCl₃ Journal Article
Thermal Atomic Layer Etching of Gallium Oxide Using Sequential Exposures of HF and Various Metal Precursors Journal Article
Thermal atomic layer etching of germanium-rich SiGe using an oxidation and "conversion-etch" mechanism Journal Article
Thermal Atomic Layer Etching of Gold Using Sulfuryl Chloride for Chlorination and Triethylphosphine for Ligand Addition Journal Article
Thermal atomic layer etching of HfO₂ using HF for fluorination and TiCl₄ for ligand-exchange Journal Article
Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions Journal Article
Thermal Atomic Layer Etching of Nickel Using Sequential Chlorination and Ligand-Addition Reactions Journal Article
Thermal atomic layer etching of silicon nitride using an oxidation and "conversion etch" mechanism Journal Article
Thermal Atomic Layer Etching of Silicon Using O₂, HF, and Al(CH₃)₃ as the Reactants Journal Article
Thermal Atomic Layer Etching of SiO₂ by a "Conversion-Etch" Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride Journal Article
Thermal Atomic Layer Etching of Titanium Nitride Using Sequential, Self-Limiting Reactions: Oxidation to TiO₂ and Fluorination to Volatile TiF₄ Journal Article
Thermal atomic layer etching of VO₂ using sequential BCl₃ and SF₄ exposures: Observation of conversion, ligand-exchange, and oxidation state changes Journal Article
Thermal Atomic Layer Etching of Zinc Sulfide Using Sequential Trimethylaluminum and Hydrogen Fluoride Exposures: Evidence for a Conversion Mechanism Journal Article
Thermal Atomic Layer Etching of ZnO by a "Conversion-Etch" Mechanism Using Sequential Exposures of Hydrogen Fluoride and Trimethylaluminum Journal Article
Thermal atomic layer etching: A review Journal Article

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