Electron-Enhanced Deposition of Titanium-, Silicon- and Tungsten-Containing Films at Low Temperatures Using Volatile Precursors with Various Reactive Background Gases Journal Article uri icon

Overview

publication date

  • June 16, 2025

Date in CU Experts

  • June 22, 2025 1:09 AM

Full Author List

  • Sobell ZC; Cavanagh AS; George SM

author count

  • 3

citation count

  • 0

Other Profiles

International Standard Serial Number (ISSN)

  • 0897-4756

Electronic International Standard Serial Number (EISSN)

  • 1520-5002