High Pressure Resistance in Omniphobic Distillation Membranes with Re-entrant Nanostructures. Journal Article uri icon

Overview

abstract

  • We developed pressure-resistant omniphobic membranes that enable stable distillation of low-surface-tension liquids at applied pressures exceeding 15 bar. Membranes were synthesized by grafting re-entrant nanostructures onto porous alumina membranes, followed by hydrophobic modification. The membranes exhibited a high liquid entry pressure of 36.2 bar with water and withstood an applied pressure up to 15.5 bar with a low-surface-tension 15 wt % ethanol-water mixture. Simulations revealed that the enhanced wetting resistance is due to the presence of re-entrant structures, which facilitated a 220% increase in wetting pressure for the low-surface-tension liquid compared to a control membrane with cylindrical pores. We further demonstrated stable pressure-driven distillation of low-surface-tension liquids, achieving higher than 97% salt rejection. This work is the first demonstration of distillation membranes operating with low-surface-tension liquids under high applied pressures and provides critical validation of wettability theory under extreme pressures.

publication date

  • April 18, 2025

Date in CU Experts

  • April 19, 2025 6:34 AM

Full Author List

  • Lee S; Laris OA; Hjelvik EA; Hoek EMV; Straub AP

author count

  • 5

Other Profiles

Electronic International Standard Serial Number (EISSN)

  • 1530-6992