Extreme Ultraviolet Scatterometry for Characterizing Nanometer Scale Features in a Damascene Sample Conference Proceeding uri icon

Overview

abstract

  • We characterize nanoscale out-of-plane features on an industrially relevant semiconductor sample using a coherent extreme ultraviolet high harmonic generation source at 29nm. The advantages of using 13.5nm light are also shown.

publication date

  • January 1, 2024

Date in CU Experts

  • February 9, 2025 12:35 PM

Full Author List

  • Klein C; Jenkins N; Shao Y; Li Y; Park S; Kim W; Kapteyn H; Murnane M

author count

  • 8

Other Profiles

Additional Document Info

start page

  • FTu1B.2

end page

  • FTu1B.2